Initial study of Nickel Electrolyte for EnFACE Process
DOI: https://doi.org/10.12777/ijse.8.2.135-140
Abstract
Nickel electrolyte for a micro-pattern transfer process without photolithography, EnFACE, has been developed. Previous work on copper deposition indicated that a conductivity of ~2.7 Sm-1 is required. Electrochemical parameters of electrolyte i.e. current density and overpotential are also crucial to govern a successful pattern replication. Therefore, the investigation focused on the measurement of physicochemical properties and electrochemical behaviour of the electrolyte at different nickel concentrations and complexing agents of chloride and sulfamate. Nickel electrolytes containing sulfamate, chloride and combined sulfamate-chloride with concentrations between 0.14 M and 0.3 M were investigated. Physicochemical properties i.e. pH and conductivity were measured to ensure if they were in the desired value. The electrochemical behaviour of the electrolytes was measured by polarisation experiments in a standard three-electrode cell. The working electrode was a copper disc (surface area of 0.196 cm2) and the counter electrode was platinum mesh. The potential was measured againts a saturated calomel reference electrode (SCE). The experiments were carried out at various scan rate and Rotating Disc Electrode (RDE) rotation speed to see the effect of scan rate and agitation. Based on the measured physicochemical properties, the electrolyte of 0.19 M nickel sulfamate was chosen for experimentation. Polarisation curve of agitated solution suggested that overall nickel electrodeposition reaction is controlled by a combination of kinetics and mass transfer. Reduction potential of nickel was in the range of -0.7 to -1.0 V. The corresponding current densities for nickel deposition were in the range of -0.1 to -1.5 mA cm-2.
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Anwar, K., Han, T., and Kim, S. M., (2010), Reversible Sealing Techniques for Microdevice Applications, Sens. Actuators B: Chem., DOI:10.1016/j.snb.2010.11.002
Atkins, P. and De Paula, J., (2009), Atkins' Physical Chemistry, 9th edition OUP Oxford.
Baudoin, R., Corlu, A., Griscom, L., Legallais, C., and Leclerc, E., (2007), Trends in the development of microfluidic cell biochips for in vitro hepatotoxicity, Toxicology in Vitro 21 535–544, DOI: 10.1016/j.tiv.2006.11.004
Beier, S. P. and Hede, P. D., (2010), Chemistry, 2nd Edition, Pp. 113 – 119, Ventus Publishing ApS.
Betancourt, T. and Brannon-Peppas, L., (2006), Micro- and nanofabrication methods in nanotechnological medical and pharmaceutical devices, International Journal of Nanomedicine:1(4) 483–495, http://www.ncbi.nlm.nih.gov/pubmed/17722281
Chen, Q., Li, G., Jin, Q.-H., Zhao, J.-L., Ren, Q.-S., and Xu, Y.-S., (2007) Journal of Microelectromechanical System, Vol. 16, No. 5.
Cui, C. Q. and J. Y. Lee (1995). "Nickel deposition from unbuffered neutral chloride solutions in the presence of oxygen." Electrochimica Acta 40(11): 1653-1662
Dini J. W., (1993) Electrodeposition: the materials science of coatings and substrates, Noyes Publication, New Jersey, Pp. 2-5.
Dolgikh, O., N. Sotskaya, et al. (2009). "Electroplating of catalytically active nickel coatings from baths of various anionic compositions." Protection of Metals and Physical Chemistry of Surfaces 45(6): 718-723.
Durbha, M. and M. E. Orazem (1998). "Current Distribution on a Rotating Disk Electrode below the Mass-Transfer-Limited Current: Correction for Finite Schmidt Number and Determination of Surface Charge Distribution." Journal of The Electrochemical Society 145(6): 1940-1949.
Franke, T. A., and Achim Wixforth, A., (2008), Microfluidics for Miniaturized Laboratories on a Chip, ChemPhysChem, 9, 2140 – 2156, doi: 10.1002/cphc.200800349
Franssila, S., (2010), Introduction to Microfabrication, 2nd Edition, John Wiley & Sons Ltd, West Sussex, United Kingdom.
Gamburg,Y. D. and Zangari, G., (2011), Theory and Practice of Metal Deposition, Springer science + Business Media, LLC, 291-292
Grayson, A. C. R., Shawgo, R. S., Johnson, A. M., Flyinn, N. T., Li, Y., Cima, M. J., and Langer, R., (2004), A BioMEMS Review: MEMS Technology for Physiologically Integrated Devices, Proceeding of The IEEE, Vol. 92, No. 1.
DOI: 10.1109/JPROC.2003.820534
Grujicic, D. and B. Pesic (2006). "Electrochemical and AFM study of nickel nucleation mechanisms on vitreous carbon from ammonium sulfate solutions." Electrochimica Acta 51(13): 2678-2690.
Harper, C. A., (2004), Electronic Materials and Processes Handbook, 3rd Edition, p. 6.12-14, McGraw-Hill Inc. New York.
Jung, E., A. Ostmann, D. Wojakowski, C. Landesberger, R. Aschenbrenner, and H. Reichl, (2003), Ultra-thin chips for miniaturized products, Microsystem Technologies, 9, 449–452.
DOI: 10.1109/ECTC.2002.1008241
Krebs, A., Knoll, T., Nußbaum, D., and Velten, T., (2012), Microsystem Technologies, 18, 11; 1871-1877, Online First™, 9 April 2012. DOI: 10.1007/s00542-012-1499-8
Madou, M. J., (2002), Fundamental of Microfabrication: The Science of Miniaturisation, CRC Press, Boca Raton, FL; London
Nasirpouri, F., Bending, S. J., Peter, L. M., and Fangohr, H., (2011), Electrodeposition and magnetic properties of three-dimensional bulk and shell nickel mesostructures, Thin Solid Films 519 (2011) 8320–8325
Nouraei, S. and Roy, S., (2008), Electrochemical Process for Micropattern Transfer without Photolithography: A Modeling Analysis, Journal of The Electrochemical Society, Vol. 155 No. 2 Pp. D97-D103, doi: 10.1149/1.2806032
O'Donnell-Maloney, M. J. and Little, D.P., (1996), Microfabrication and array technologies for DNA sequencing and Genetic Analysis: Biomolecular Engineering 13 151-157, DOI: 10.1016/S1050-3862(96)00166-0
Paunovic, M. and Schlesinger, M., (1998) Fundamentals of Electrochemical Fabrication, John Wiley & Sons, Inc. New York.
Pourbaix, M., (1974), Atlas of Electrochemical Equilibria in Aqueous Solution, 2nd English Edition, Houston Tech. National Association of Corrosion Engineering, p. 331-341.
Roy, S., (2007), Fabrication of micro- and nano-structured materials using mask-less processes, journal of Physics D: Applied Physics, 40 p. 413-416, doi:10.1088/0022-3727/40/22/R02
Roy, S., (2009), EnFACE: A Mask Less Process for Circuit Fabrication, Circuit World 35/3 8-11, DOI: 10.1108/03056120910979495
Roy, S., (2010), Electrochemical Microfabrication without Photolithography – a Sustainable Manufacturing Process, Innovative electronics Manufacturing Research Centre (IeMRC), 5th Annual Conference, Loughborough University. Available online at (accessed 23rd June 2011):
http://www.lboro.ac.uk/research/iemrc/documents/EventsDocuments/5th%20Annual%20Conference%202010/Presentations/Roy-Micro%20Pattern%20Transfer%20for%20IeMRC.pdf
Sabine R, Christophe H, and Michael M (2005) J Electrochem Soc 152(4):C248–C254
Saraby-Reintjes, A. and M. Fleischmann (1984). "Kinetics of electrodeposition of nickel from watts baths." Electrochimica Acta 29(4): 557-566.
SchÖnenberger, I., (2004), Electrochemical microfabrication without photolitography : copper substrates, MPhil Thesis, School of Chemical Engineering and Advanced Materials, Newcastle University.
SchÖnenberger, I. and Roy, S., (2005), Microscale pattern transfer without photolithography of substrates, Electrochimica Acta 51 pp. 809 – 819
Seo, M. H., et al. (2005). "The effects of pH and temperature on Ni–Fe–P alloy electrodeposition from a sulfamate bath and the material properties of the deposits." Thin Solid Films 489(1–2): 122-129.
Shina, S. G., (2008), Green Electronics Design and Manufacturing: Implementing Lead-Free and RoHS-Compliant Global Products, p. 301-304, McGraw-Hill, Inc. New York, NY, USA.
Tadigadapa, S. A. and Najafi, N., (2003), Developments in Microelectromechanical Systems (MEMS): A Manufacturing Perspective, Transactions of the ASME: Journal of Manufacturing Science and Engineering, Vol. 125, 816-823, DOI: 10.1115/1.1617286
Tolfree, D. W. L., (1998), Microfabrication using synchrotron radiation, Rep. Prog. Phys. 61 313–351 doi:10.1088/0034-4885/61/4/001
Van Noije, W. A. M., Swart, J. W., Seabra, A. C., Verdonck, P., Zambom, L. S., Diniz, J. A., Doi, I., Zakia, M. B. P., Mansano, R. D., and Moreiral, L., (2001), Initiatives for Promotion of Microelectronics and Micro fabrication at Sao Paulo State Universities – Brazil, IEEE. DOI: 10.1109/UGIM.2001.960285
Watson, S. J., Smallwood, R. H., Brown, B. H., Cherian, P., and Bardhan, K. D. (1996) Physiol. Meas. 17 21
Whitten, K. W., Davis, R. E., and Peck, M. L. (2009), Chemistry, 9 edition, Thomson Brooks/Cole, P. 756
Wong, Hei, Filip, V., Wong, C. K., and Chung, P. S., (2006), Silicon Integrated Photonics for Microelectronics Evolution, Proc. 25th International Conference on Microelectronics (MIEL), IEEE. DOI: 10.1109/ICMEL.2006.1650947
Wu, Q.-B., T. A. Green, et al. (2011). "Electrodeposition of microstructures using a patterned anode." Electrochemistry Communications 13(11): 1229-1232. DOI: 10.1016/j.elecom.2011.08.037
Xu, Q., Y.-l. Qiao, et al. (2009). "Electro-deposition and characterizations of nickel coatings on the carbon–polythene composite." Journal of Applied Electrochemistry 39(12): 2513-2519.
Zoski, C. G. ( 2007), Handbook of Electrochemistry,Pp. 453, 840, Elsevier, Oxford, UK.