PENUMBUHAN LAPISAN TIPIS SILIKON MIKROKRISTAL TERHIDROGENASI DENGAN TEKNIK HWC-VHF-PECVD

Ida Usman; Darwin Ismail; Heri Sutanto; Toto Winata

doi:10.14710/reaktor.13.1.31-36

DOI: https://doi.org/10.14710/reaktor.13.1.31-36

PENUMBUHAN LAPISAN TIPIS SILIKON MIKROKRISTAL TERHIDROGENASI DENGAN TEKNIK HWC-VHF-PECVD

*Ida Usman - Jurusan Fisika FMIPA, Universitas Haluoleo, Kendari, Indonesia

Darwin Ismail - Jurusan Fisika FMIPA, Universitas Haluoleo, Kendari, Indonesia

Heri Sutanto - Jurusan Fisika FMIPA, Universitas Diponegoro Semarang, Indonesia

Toto Winata - Program Studi Fisika FMIPA, Institut Teknologi Bandung, Indonesia

Published: 2 May 2010.

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Abstract

Telah dikembangkan teknik HWC-VHF-PECVD (Hot Wire Cell Very High Frequency Plasma Enhanced Chemical Vapor Deposition) untuk menumbuhkan lapisan tipis silikon mikrokristal terhidrogenasi (mc-Si:H). Dari hasil penumbuhan lapisan tipis yang dilakukan, teknik HWC-VHF-PECVD memperlihatkan laju deposisi yang lebih tinggi dibandingkan laju deposisi lapisan tipis yang diperoleh dari teknik PECVD maupun teknik VHF-PECVD konvensional. Berdasarkan hasil pengukuran XRD dan SEM, lapisan yang diperoleh pada temperatur filamen yang rendah masih berstruktur amorf. Indikasi yang mengarah pada pembentukan lapisan tipis berstruktur mikrokristalin mulai terlihat pada temperatur filamen ≥ 500^oC, dimana puncak-puncak di fraksi spektrum XRD untuk orientasi kristalin tertentu mulai terbentu, sejalan dengan pembentukan butiran-butiran kristalin dari hasil foto SEM permukaan lapisan-lapisan tersebut.

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Keywords: butir kristalin, teknik HWC-VHF-PECVD, c-Si:H

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Section: Research Article

Language : EN

In Volume 13, Nomor 1, Juni 2010

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